Stabilization of unstable and metastable InP native oxide thin films by interface effects

dc.contributor.authorPunkkinen Marko PJ
dc.contributor.authorLahti Antti
dc.contributor.authorHuhtala Jesse
dc.contributor.authorLehtiö Juha-Pekka
dc.contributor.authorJahanshah Rad Zahra
dc.contributor.authorKuzmin Mikhail
dc.contributor.authorLaukkanen Pekka
dc.contributor.authorKokko Kalevi
dc.contributor.organizationfi=fysiikan ja tähtitieteen laitos|en=Department of Physics and Astronomy|
dc.contributor.organizationfi=materiaalitutkimuksen laboratorio|en=Materials Research Laboratory|
dc.contributor.organization-code1.2.246.10.2458963.20.15561262450
dc.contributor.organization-code1.2.246.10.2458963.20.55477946762
dc.converis.publication-id66839556
dc.converis.urlhttps://research.utu.fi/converis/portal/Publication/66839556
dc.date.accessioned2025-08-28T02:44:23Z
dc.date.available2025-08-28T02:44:23Z
dc.description.abstract<p>III-V semiconductor - oxide interfaces have attracted huge interest due to their substantial potential in electronic applications. However, due to the extreme complexity of the modeling of the interfaces, there are only few <em>ab initio</em> studies of these interfaces.<br></p><p>Several model interfaces of native InPO<sub>4</sub> oxides are designed in this study. It is shown that energies of the (quasi-)coherent interfaces are much smaller than energies of the incoherent interfaces. Furthermore, it is pointed out that the interface energy can stabilize oxide structures not found in bulk form. Relatively small strain energy and configurational match imply a small interface energy.<br></p><p>It is estimated that the gap state density of the In-terminated quasi-coherent interfaces is small or zero. However, partial oxidation of the substrate P atoms, which can be induced, <em>e.g.</em>, by non-stoichiometry of the oxide, causes distinct gap states. This is a mechanism to explain Fermi level pinning of the III-V - oxide interfaces. Non-stoichiometric compositions are also investigated. Experimental results on InP native oxide growth are discussed. The models can be used to study various properties of the interfaces and more complex models including, <em>e.g.</em>, dislocations or non-planar surfaces can be based on the models.</p>
dc.identifier.eissn1873-5584
dc.identifier.jour-issn0169-4332
dc.identifier.olddbid209621
dc.identifier.oldhandle10024/192648
dc.identifier.urihttps://www.utupub.fi/handle/11111/48958
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0169433221019097?via%3Dihub
dc.identifier.urnURN:NBN:fi-fe2021093048893
dc.language.isoen
dc.okm.affiliatedauthorPunkkinen, Marko
dc.okm.affiliatedauthorLahti, Antti
dc.okm.affiliatedauthorHuhtala, Jesse
dc.okm.affiliatedauthorLehtiö, Juha-Pekka
dc.okm.affiliatedauthorJahanshah Rad, Zahra
dc.okm.affiliatedauthorKuzmin, Mikhail
dc.okm.affiliatedauthorLaukkanen, Pekka
dc.okm.affiliatedauthorKokko, Kalevi
dc.okm.discipline114 Physical sciencesen_GB
dc.okm.discipline216 Materials engineeringen_GB
dc.okm.discipline114 Fysiikkafi_FI
dc.okm.discipline216 Materiaalitekniikkafi_FI
dc.okm.internationalcopublicationnot an international co-publication
dc.okm.internationalityInternational publication
dc.okm.typeA1 ScientificArticle
dc.publisherELSEVIER
dc.publisher.countryNetherlandsen_GB
dc.publisher.countryAlankomaatfi_FI
dc.publisher.country-codeNL
dc.relation.articlenumber150848
dc.relation.doi10.1016/j.apsusc.2021.150848
dc.relation.ispartofjournalApplied Surface Science
dc.relation.volume567
dc.source.identifierhttps://www.utupub.fi/handle/10024/192648
dc.titleStabilization of unstable and metastable InP native oxide thin films by interface effects
dc.year.issued2021

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