An Ion-Sensitive Floating Gate FET Model: Operating Principles and Electrofluidic Gating

dc.contributor.authorKaisti M
dc.contributor.authorZhang Q
dc.contributor.authorPrabhu A
dc.contributor.authorLehmusvuori A
dc.contributor.authorRahman A
dc.contributor.authorLevon K
dc.contributor.organizationfi=Suomalais-intialainen diagnostiikan tutkimuskeskus (IFDRC)|en=Indo-Finnish Diagnostics Research Centre (IFDRC)|
dc.contributor.organizationfi=Technology Research Center TRC|en=Technology Research Center TRC|
dc.contributor.organization-code1.2.246.10.2458963.20.58905910210
dc.contributor.organization-code2606206
dc.converis.publication-id3997142
dc.converis.urlhttps://research.utu.fi/converis/portal/Publication/3997142
dc.date.accessioned2022-10-28T14:39:50Z
dc.date.available2022-10-28T14:39:50Z
dc.description.abstract<p> We present a model that can be used to compute the charging and potential at any point of the electrochemical system comprising the ion-sensitive floating gate FET (ISFGFET) exposed to an electrolyte solution. In contrast to ion-sensitive FETs, the sensor has an additional control input gate. The model predicts the possibility for electrofluidic gating when the control gate (CG) is used in conjunction with a reference electrode (RE). Electrofluidic gating is the field-effect control over the electric double layer. We consider the applicability of electrofluidic gating in realizable devices and simulate the relationships between oxide properties and electrolyte solution to varying potentials of the CG and the RE. The oxide/electrolyte solution model is merged to the SPICE model of the transistor to create a unified model that can be used to simulate the transfer characteristics of the sensor in absolute terms to change input and electrolyte solution conditions. We simulate the sensor transfer characteristics with common Al2O3 surface to change the pH of the electrolyte solution and compare them to measurements. The results clarify the operation of ISFGFET and its applicability in electrofluidic gating.</p>
dc.format.pagerange2628
dc.format.pagerange2635
dc.identifier.jour-issn0018-9383
dc.identifier.olddbid189555
dc.identifier.oldhandle10024/172649
dc.identifier.urihttps://www.utupub.fi/handle/11111/40550
dc.identifier.urnURN:NBN:fi-fe2021042715479
dc.language.isoen
dc.okm.affiliatedauthorLehmusvuori, Ari
dc.okm.affiliatedauthorKaisti, Matti
dc.okm.discipline220 Industrial biotechnologyen_GB
dc.okm.discipline220 Teollinen bioteknologiafi_FI
dc.okm.internationalcopublicationinternational co-publication
dc.okm.internationalityInternational publication
dc.okm.typeA1 ScientificArticle
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.publisher.countryUnited Statesen_GB
dc.publisher.countryYhdysvallat (USA)fi_FI
dc.publisher.country-codeUS
dc.relation.doi10.1109/TED.2015.2441878
dc.relation.ispartofjournalIEEE Transactions on Electron Devices
dc.relation.issue8
dc.relation.volume62
dc.source.identifierhttps://www.utupub.fi/handle/10024/172649
dc.titleAn Ion-Sensitive Floating Gate FET Model: Operating Principles and Electrofluidic Gating
dc.year.issued2015

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